Chemical mechanical polishing solution

• Main Authors: DONG ZETONG, TAN MINGYUE, SUN CHENMIN, ZHU WEIHAN, SUN JINTAO, WANG CHEN, WANG SONG, GU QINYUAN
• Format: Patent
• Language: Chinese; English
• Published: 30.06.2023
• Subjects: ADHESIVES; CHEMISTRY; DYES; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; SKI WAXES

The invention provides a chemical mechanical polishing solution. The chemical mechanical polishing solution comprises alpha-aluminum oxide nano grinding particles treated by a nonionic surfactant, an oxidizing agent, organic carboxylic acid, water and a pH regulator. The chemical mechanical polishin...