Groove type silicon carbide MOSFET device and preparation process thereof

The invention provides a trench type silicon carbide MOSFET device and a preparation process thereof, the MOSFET device comprises a high-concentration N-type drain electrode and drain electrode metal, a low-concentration N-type epitaxial layer is arranged on the high-concentration N-type drain elect...

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Bibliographic Details
Main Authors ZHU CHENKAI, ZHU YUANZHENG, YANG ZHUO, HUANG XUEQUAN
Format Patent
LanguageChinese
English
Published 27.06.2023
Subjects
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