Fluid processing system, method and lithographic apparatus

• Main Authors: BERENDSEN CHRISTIANUS WILHELMUS JOHANNES, GATTOBIGIO GIOVANNI LUCA, EUMMELEN ERIK HENRICUS EGIDIUS CATHARINA, ROOPS CORNELIUS MARIA
• Format: Patent
• Language: Chinese; English
• Published: 23.06.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Described herein is a fluid processing system for a lithographic apparatus wherein the fluid processing system is configured to confine immersion liquid to a liquid confinement space between a portion of a projection system and a surface of a substrate in the lithographic apparatus, the fluid treatment system includes a projection system, whereby a radiation beam projected from the projection system can irradiate a surface of a substrate by passing through an immersion liquid, the fluid treatment system including: a damping portion disposed between a first extraction member and a second extraction member, the first extraction member and the second extraction member configured to extract a fluid; wherein the damping portion is configured to support a meniscus of the immersion liquid between a surface of the damping portion and a surface of the substrate. 本文描述了一种用于光刻设备的流体处理系统，其中流体处理系统被配置成将浸没液体限制于投影系统的一部分与光刻设备中的衬底的表面之间的液体限制空间，由此从投影系统投影的辐射束能够通过穿过浸没液体而照射衬底的表面，流体处理系统包括：阻尼部，阻尼部被布置在第一提取构件与第二提取构件之间，第一提取构件和第二提取构件被配置成提取