Apparatus and method for depositing thick metal nitride coatings through supercritical fluid paths

• Main Authors: AIMONIER CYRIL, GIROIRE BAPTISTE SIMON, CAVALLOCK MARJORIE CHRISTINA, AUBERT GUILLAUME, GUILLAUME BERTRAND, PRON ANGELI NADINE JENNY
• Format: Patent
• Language: Chinese; English
• Published: 23.05.2023
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a device (100) for depositing thick metal nitrides on a sample (104) through a supercritical fluid route, comprising:-a first enclosure (110) forming a first closed volume (V1); -a second housing (120) placed in the first housing and delimited by an inner wall (102) permeable to electromagnetic radiation, forming a second closed volume (V2) intended to contain the fluid under supercritical conditions; -a dielectric heat transfer fluid circulating around the second enclosure in the first volume; -a sample holder (105) present in the second volume; an induction heater (103) surrounding the second housing; -an inlet (150, 151) for introducing a fluid and at least one precursor material into the second housing; and an outlet (152) for purifying the second volume. 本发明涉及一种用于通过超临界流体路线，用于在样品(104)上沉积厚金属氮化物的装置(100)，包括：-形成第一封闭容积(V1)的第一外壳(110)；-第二外壳(120)，其被放置在第一外壳中，并且由可透过电磁辐射的内壁(102)界定，形成旨在容纳超临界条件下的流体的第二封闭容积(V2)；-在第一容积中围绕第二外壳循环的介电传热流体；-在第二容积中存在的样品保持架(105)；-围绕第二外壳的感应加热器(103)；-入口(150、151)，用于将流体和至少一