Pattern fabric flaw detection method and system and detection terminal

• Main Authors: SHENG SHOUXIANG, LI CHUNGUANG, WANG GUODONG, CAO GUOTAI, LI FENG, GAO SONG, CUI CHENGYAO, WEI TIANTIAN, YU JIAN, GAO XIUBIN, LI KE, XING XUNBIN
• Format: Patent
• Language: Chinese; English
• Published: 23.05.2023
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; PHYSICS

The invention provides a pattern fabric defect detection method and system and a detection terminal, and relates to the technical field of textile industry, and the method comprises the steps: obtaining a to-be-detected fabric image and a template image, and obtaining a saliency image and a foreground point; based on the position information of the foreground points, analyzing a clustering result of the foreground points, and obtaining a candidate region according to the clustering result; and detecting the candidate area to judge whether flaws exist or not. The algorithm efficiency is optimized through a random point group heuristic optimization method and a linear interpolation method. And according to the mapping relationship between the to-be-detected image and the template image obtained by LAT, obtaining a saliency image and a foreground point by using a dynamic threshold method. And then clustering the foreground points by using a minimum spanning tree algorithm and a DEVI evaluation index and obtainin