Model measurement method based on extended Lustre language

• Main Authors: WANG LEI, YASUTSUNE, ZHANG XIAOXIAO, ZHANG JIANWEI, JIA ZHANGTAO, SHAO SA, KONG XIANGBING, LI YASI, TAO JINLONG, JIN YUCHUAN, LI HAOYU, FENG DACHENG, WANG YUNZE, PANG HAOMING
• Format: Patent
• Language: Chinese; English
• Published: 23.05.2023
• Subjects: CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; PHYSICS

The invention relates to a model measurement method based on an extended Lustre language, and belongs to the field of software measurement. According to the method, the model structure tree is designed according to the extended Lustre language, and the model structure tree corresponding to the project can be generated through visual modeling; the method comprises the following steps: designing predefined metric elements including four aspects of model object measurement, operator object measurement, package object measurement and state machine object measurement, and designing a metric element data dictionary according to the metric elements; designing different metric value calculation modes according to different metric elements; a model measurement module based on an extended Lustre language is successfully added in an OnModel modeling platform, and a measurement result is displayed through a table. According to the method, model measurement is carried out based on an extended Lustre language structure, a