Apparatus and method for processing reticle and pellicle assembly

• Main Authors: MOERS JOHANNES HUBERTUS JOSEPHUS, YEGHOUBI PAYAM, VERMEULEN PAUL ALEXANDER, DEMEYERE CHAD A, NIKIPAROV ALEXANDER, VAN DE KERKHOF MARCUS ADRIANUS, SALMASO GUIDO, VADIM YEVGENYEVICH BANINE
• Format: Patent
• Language: Chinese; English
• Published: 25.04.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

An apparatus for reducing a partially oxidized reticle and pellicle assembly, comprising: a support; a hydrogen supply device; and an electron source. And the supporting piece is used for supporting the mask plate and the surface film assembly. The hydrogen supply device is operable to supply hydrogen to the vicinity of the reticle and pellicle of the pellicle assembly when the reticle and pellicle assembly are supported by the support. The electron source is operable to direct the incidence of electrons onto the reticle and pellicle of the pellicle assembly when the reticle and pellicle assembly are supported by the support. 一种用于还原部分氧化的掩模版和表膜组件的设备，包括：支撑件；氢气供应装置；以及电子源。所述支撑件用于支撑掩模版和表膜组件。所述氢气供应装置可操作以在掩模版和表膜组件由所述支撑件支撑时将氢气供应到掩模版和表膜组件的表膜附近。所述电子源可操作以在掩模版和表膜组件由所述支撑件支撑时引导电子入射到掩模版和表膜组件的表膜上。