Radiation-sensitive composition, hardened film and manufacturing method thereof, and display device

• Main Authors: NAKANISHI TAKUYA, ASAOKA TAKAHIDE, TAKOJIMA KAORU, ISHIKAWA DAISUKE
• Format: Patent
• Language: Chinese; English
• Published: 14.04.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides a radiation-sensitive composition capable of forming a film with excellent developing sealing performance and hardening sealing performance, a hardened film, a manufacturing method of the hardened film and a display device. A radiation-sensitive composition containing: (A-1) at least one polymer selected from the group consisting of a polymer containing a structural unit having a group represented by formula (1) or an acid-dissociable group, and a siloxane polymer; (B-1) a photoacid generator; (C-1) a solvent; and (E) a compound having at least one functional group (X) selected from the group consisting of an alkoxysilyl group, an oxeteropropyl group, an oxeterobutyl group, a mercapto group, a (meth) acryloyl group, a vinyl group, and an amino group, and a cardol structure. In formula (1), R1, R2, and R3 each represents a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group having 1-6 carbon atoms, an alkyl group having 1-10 carbon atoms, or a phenyl group. In this connectio