Photo-curable ink composition as well as preparation method and application thereof

• Main Authors: WANG NA, CHEN HOUYIN, HE XIN
• Format: Patent
• Language: Chinese; English
• Published: 14.04.2023
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; ELECTRICITY; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

The invention belongs to the technical field of ink compositions, and relates to a photocurable ink composition as well as a preparation method and application thereof. The photocurable ink composition comprises a photocurable monofunctional silicon-containing monomer A, a photocurable bifunctional silicon-containing monomer B, a photocurable non-silicon monomer C and a photoinitiator D. The photocurable monofunctional silicon-containing monomer A, the photocurable bifunctional silicon-containing monomer B, the photocurable non-silicon monomer C and the photoinitiator D. The photocurable ink composition has high photocuring rate and plasma etching resistance, the number of free small molecules is reduced, so that emission of offensive gases is reduced, meanwhile, an organic layer formed by curing has excellent flexibility, and the bendability of an organic light-emitting diode is ensured. 本发明属于油墨组合物技术领域，涉及一种可光固化油墨组合物及其制备方法和应用。该可光固化油墨组合物，包括可光固化单官能度含硅单体A，可光固化双官能度含硅单体B，可光固化非硅单体C和光引发剂D。这种可光固化油墨组合物，具有高光固化率以及耐等离子体蚀