Cleaning equipment and cleaning method

• Main Authors: CHEN MING, ZHAO JIEHUA, LUO YONGWEI
• Format: Patent
• Language: Chinese; English
• Published: 11.04.2023
• Subjects: AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR; CHEMISTRY; CLEANING; CLEANING IN GENERAL; CRYSTAL GROWTH; METALLURGY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; REFINING BY ZONE-MELTING OF MATERIAL; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE; SINGLE-CRYSTAL-GROWTH; TRANSPORTING; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL

The embodiment of the invention relates to the field of crystalline silicon production, and discloses cleaning equipment and a cleaning method. According to the cleaning device, the inner wall of the exhaust pipeline of the single crystal furnace exhaust system is cleaned through the dust collection assembly, the driving device and the dust collection barrel, so that cleaned oxide solids are conveniently absorbed in time, volatile matters are prevented from drifting away after cleaning, and the environmental sanitation of the inner wall of the exhaust pipeline of the single crystal furnace is ensured; the lifting device drives the base plate to move, so that the driving device and the dust collection assembly are driven to move, when the mechanical device is used for cleaning, the force is controllable, and it can be guaranteed that the multiple cleaning effects are consistent; and the cleaning equipment is used for cleaning, so that the personnel demand during cleaning is reduced, the manpower is saved, and