Multi-layer multi-functional spacer stack
The invention relates to a multi-layer multi-function spacer stack. Techniques for forming a semiconductor device having a multi-layer spacer structure are provided. In an example, a semiconductor device includes a semiconductor region extending between a source region and a drain region and a gate...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
07.04.2023
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Subjects | |
Online Access | Get full text |
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