Multi-layer multi-functional spacer stack

The invention relates to a multi-layer multi-function spacer stack. Techniques for forming a semiconductor device having a multi-layer spacer structure are provided. In an example, a semiconductor device includes a semiconductor region extending between a source region and a drain region and a gate...

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Bibliographic Details
Main Authors BOUCHET GREGOIRE, A. C. H. WEI
Format Patent
LanguageChinese
English
Published 07.04.2023
Subjects
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