Ring structures and systems for use in plasma chambers

• Main Authors: MACE ADAM, MACHUSHKIN ALEKSANDR ALEKSANDROVICH, MARAKHTANOV ALEXEI, HOLLAND JOHN, KELLOGG MICHAEL C, CHEN ZHIGANG, KOZAKEVICH FELIX
• Format: Patent
• Language: Chinese; English
• Published: 07.04.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

Systems and methods for securing an edge ring to a support ring are described. The edge ring is secured to the support ring by a plurality of fasteners inserted into a bottom surface of the edge ring. Securing the edge ring to the support ring provides stability of the edge ring during processing of a substrate within a plasma chamber. Further, the edge ring is secured to the support ring such that the edge ring is secured to the plasma chamber because the support ring is secured to an insulator ring which is connected to an insulator wall of the plasma chamber. Further, during processing of the substrate, the support ring and the edge ring are pulled down vertically using one or more fastening mechanisms, and the support ring and the edge ring are pushed up vertically using fastening mechanisms to remove the edge ring and the support ring from the plasma chamber. 描述了用于将边缘环固定到支撑环的系统和方法。边缘环通过插入到边缘环的底表面中的多个紧固件固定到支撑环上。将边缘环固定到支撑环上在等离子体室内处理衬底期间提供边缘环的稳定性。另外，将边缘环固定到支撑环上使得边缘环固定到等离子体室上，因为支撑环被固定到绝缘体环，该绝缘体环连接到等离子体室的绝缘体壁