Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositions

• Main Authors: AQAD EMAD, PARK JONG KEUN, CUI LI, POPERE BHOOSHAN C, YINJIE CEN, LEE CHUNG-BONG
• Format: Patent
• Language: Chinese; English
• Published: 04.04.2023
• Subjects: ACYCLIC OR CARBOCYCLIC COMPOUNDS; APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC CHEMISTRY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

Disclosed is a compound comprising an aromatic group or a heteroaromatic group wherein the aromatic group or the heteroaromatic group comprises a first substituent comprising an ethylenically unsaturated double bond, a second substituent being an iodine atom, and a third substituent comprising an acid labile group, wherein the first substituent, the second substituent and the third substituent are each bonded to a different carbon atom of an aromatic or heteroaromatic group. 公开了一种包含芳香族基团或杂芳香族基团的化合物，其中该芳香族基团或该杂芳香族基团包括包含烯键式不饱和双键的第一取代基、为碘原子的第二取代基和包含酸不稳定基团的第三取代基，其中该第一取代基、该第二取代基和该第三取代基各自键合到芳香族基团或杂芳香族基团的不同碳原子上。