Substrate processing apparatus

• Main Authors: MURAMOTO RYO, YASUTAKE YOSUKE
• Format: Patent
• Language: Chinese; English
• Published: 28.03.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention provides a substrate processing apparatus. In a substrate processing apparatus that processes a rotating substrate (9) by supplying a processing liquid to the substrate (9), an upper support body (31), which is an annular member, is detachably mounted on a lower support body (21) that supports the substrate (9). The upper support body (31) covers the outer edge of the substrate (9) and rotates together with the lower support body (21). The upper supporting body (31) comprises an annular side wall part (311) and an annular upper part (312), wherein the annular side wall part (311) is opposite to the outer periphery of the substrate (9) and the outer periphery of the upper supporting body (31) in the radial direction; and the annular upper part (312) extends from the annular side wall part (311) to the radial inner direction and is opposite to the outer edge part of the upper surface of the substrate (9) in the vertical direction. The opening area of the annular upper part (312) is 1/2 or more of