Polycarbonate formulation and carrier for semiconductor wafers that is opaque to certain light wavelengths

由同样的,但各种离子杂质,特别是硫酸根离子和氯离子,含量小于300ppb的芳族聚碳酸酯制成的芳族聚碳酯组合物及其制品,前者系利用加入,以聚碳酸酯组合物重量为基准,约1%(重量)的水性介质使离子杂质随排气而脱除制备的。优选该排气在挤塑机对聚碳酸酯组合物混炼时,并优选在真空下进行。而且,该聚碳酸酯树脂的挤出丝条是在硫酸根离子及氯离子浓度小于300ppb的水浴中进行骤冷的。 An aromatic polycarbonate composition and articles made from same having less than 300 parts per billion each of i...

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Bibliographic Details
Main Authors MARTIN J. LINDWAY, JOHN G. SKABARDONIS, GARY EUGENE SPILMAN
Format Patent
LanguageChinese
English
Published 21.07.2004
Edition7
Subjects
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Summary:由同样的,但各种离子杂质,特别是硫酸根离子和氯离子,含量小于300ppb的芳族聚碳酸酯制成的芳族聚碳酯组合物及其制品,前者系利用加入,以聚碳酸酯组合物重量为基准,约1%(重量)的水性介质使离子杂质随排气而脱除制备的。优选该排气在挤塑机对聚碳酸酯组合物混炼时,并优选在真空下进行。而且,该聚碳酸酯树脂的挤出丝条是在硫酸根离子及氯离子浓度小于300ppb的水浴中进行骤冷的。 An aromatic polycarbonate composition and articles made from same having less than 300 parts per billion each of ionic impurities, particularly Sulfate and Chloride ions prepared by devolatilizing the ionic impurites from a polycarbonate composition employing an aqueous medium of about 1% by weight based on the weight of the polycarbonate composition. Preferably the devolatilizing is carried out in an extruder during compounding the polycarbonate composition and preferably under a vacuum. Also, the extruded strands of polycarbonate resin are quenched in a water bath having a Sulfate and Chloride ion content of less then 300 ppb each.
Bibliography:Application Number: CN19981026002