HEAT TREATMENT UNIT AND SUBSTRATE PROCESSING APPARATUS

• Main Authors: LEE JAE-SUNG, PARK CHUN-WOO, SONG KYOUNG-WON
• Format: Patent
• Language: Chinese; English
• Published: 07.03.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention provides a heat treatment unit and a substrate processing apparatus, the heat treatment unit including: a chamber provided with a substrate processing apparatus, the substrate processing apparatus including: a process chamber in which an upper chamber and a lower chamber are in contact with each other to form a processing space defined by the upper chamber and the lower chamber; a heating plate positioned in the processing space to heat the substrate; a lift pin for placing a substrate on the heating plate, or for moving a substrate placed on the heating plate to be spaced apart from the heating plate; a driving member connected to the upper chamber or the lower chamber to vertically drive the upper chamber or the lower chamber; a discharge member connected to a central region of the upper chamber to discharge a treatment space; and an airflow blocking member disposed on an upper surface of the heating plate and formed to surround an edge of the substrate so as to block surrounding airfl