Graph symmetry processing method, graph symmetry processing system and computer medium

• Main Authors: GAO SHIJIA, WANG CHENGJIN
• Format: Patent
• Language: Chinese; English
• Published: 07.03.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CALCULATING; CINEMATOGRAPHY; COMPUTING; COUNTING; ELECTROGRAPHY; HOLOGRAPHY; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to the technical field of photoetching, in particular to a graph symmetry processing method, a graph symmetry processing system and a computer medium, and the graph symmetry processing method comprises the following steps: obtaining a main graph needing photoetching and a corresponding auxiliary graph; placing an auxiliary graph outside the main graph according to a preset mode; obtaining an optimization dependency relationship based on a traversal rule of a preset auxiliary graph; executing an auxiliary graph traversal rule and performing optimization processing on the auxiliary graph based on a result of optimizing the dependency relationship; and carrying out conflict solving processing on the optimized auxiliary graph to obtain a required exposure graph comprising the main graph. According to the method, the independent auxiliary graph traversal rule is formulated, so that the auxiliary graph is not optimized only according to the initial optimization sequence when traversal is carri