Method and system for removing impurities from trichlorosilane

• Main Authors: XIA JINJING, YANG DIAN, ZHANG MENGZE, FAN XIECHENG, SONG GAOJIE, SU GUOLIANG, ZHANG XIAOJUN
• Format: Patent
• Language: Chinese; English
• Published: 07.03.2023
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; THEIR RELEVANT APPARATUS; TRANSPORTING

The invention discloses a method for adsorbing and removing impurities from trichlorosilane, which comprises the following steps: introducing trichlorosilane liquid containing impurities into a liquid-solid fluidized bed, adding an adsorbent, and adsorbing and removing the impurities from the trichlorosilane liquid, discharging the adsorbent after adsorbing the impurities into a regeneration reactor for regeneration treatment; and returning the regenerated adsorbent to the liquid-solid fluidized bed for adsorption and impurity removal again. The invention further discloses a trichlorosilane adsorption and impurity removal system. According to the invention, the trichlorosilane impurity removal process can be optimized, online continuous regeneration is realized, and the adsorption impurity removal efficiency is greatly improved. 本发明公开一种三氯氢硅吸附除杂的方法，包括：将含有杂质的三氯氢硅液体通入到液固流化床中，并加入吸附剂，对所述三氯氢硅液体进行吸附除杂；将吸附杂质后的吸附剂排出到再生反应器进行再生处理；将再生后的吸附剂返回到所述液固流化床再次进行吸附除杂。本实发明还公开一种三氯氢硅吸附除杂的系统。本发明可对三氯氢硅除杂工艺进行优化，实现在线连续再生，大大提高吸附除杂效率。