Precise vacuum window viewport and pellicle for fast metrology recovery

• Main Authors: SIMMONS, ROBERT, D, KAMBHAMPATI MAHESH K, DONKER RILPHO LUDOVICUS, MITRY MARK JOSEPH, LI SHUQI, MCKENZIE PAUL A, URONE, DIEGO, M
• Format: Patent
• Language: Chinese; English
• Published: 03.03.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Systems, devices, and methods for optical metrology in extreme ultraviolet (EUV) radiation systems are provided. An example system may include a metrology system and a window. An example metrology system may be configured to be disposed in a first environment and perform one or more measurements on a region in a second environment along an optical axis of the metrology system. The example window may be configured to be disposed to intersect the optical axis and isolate the metrology system from the second environment. The example window may also be configured to limit a lateral displacement relative to the optical axis at a dominant focus of the radiation collector to differ from a nominal lateral displacement relative to the optical axis by less than about +/-50 microns. 提供了用于极紫外(EUV)辐射系统中的光学量测的系统、设备和方法。示例系统可以包括量测系统和窗口。示例量测系统可以被配置为被设置在第一环境中，并且沿着量测系统的光轴对第二环境中的区域执行一个或多个测量。示例窗口可以被配置为被设置成与光轴相交，并且将量测系统与第二环境隔离。示例窗口还可以被配置为在辐射收集器的主焦点处将相对于光轴的横向位移限制为与相对于光轴的标称横向位移相差小于约±50微米。