Device and method for dispensing gas mixture for doping silicon wafers

• Main Authors: TODOROVA VALENTINA, DULPHY HERVE
• Format: Patent
• Language: Chinese; English
• Published: 03.02.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Disclosed is an apparatus for delivering a gas mixture to a silicon wafer doping unit, the apparatus comprising: a source of dopant gas (1); a source of carrier gas (2); a mixing device (3) connected to the dopant gas container (1) and a source of carrier gas (2); a first flow rate adjusting member (41) and a second flow rate adjusting member (42) for adjusting the flow rates of the dopant gas (1) and the carrier gas (2) flowing to the mixing device (3); a control unit (5) for controlling the first and second flow regulator members (41, 42) to adjust the ratio of the first flow setpoint (D1) and the second flow setpoint (D2), said ratio being determined as a function of at least one target content (C1, C2) of the dopant gas (1) and/or the carrier gas (2) in the mixture; a buffer tank (7); a delivery line (6) for delivering the mixture at a consumption flow rate (DC) to the doping unit (10); at least one measurement sensor (8) for measuring a physical quantity and providing a first measurement signal, a change