Nozzle device

• Main Authors: PARK JAE-BUM, CHOI IN HO
• Format: Patent
• Language: Chinese; English
• Published: 03.02.2023
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; NOZZLES; PERFORMING OPERATIONS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

The nozzle device according to one embodiment of the present invention comprises: a first nozzle body having a first ejection port for ejecting plasma; a second nozzle body spaced apart from the first nozzle body, having at least one second ejection port formed therein, through which the plasma ejected from the first nozzle body passes; a coupling member spaced apart from the second nozzle body and coupled to the first nozzle body; and at least one connection member connecting the second nozzle body and the coupling member, the second nozzle body including at least one injection flow path for injecting a vapor deposition material into the second injection port. 本发明一实施例公开的喷嘴装置包括：第一嘴体，形成有用于喷射等离子体的第一喷射口；第二嘴体，与上述第一嘴体隔开，形成有至少一个第二喷射口，使得从上述第一嘴体喷射的等离子体通过；结合部件，与上述第二嘴体隔开，与上述第一嘴体相结合；以及至少一个连接部件，使得上述第二嘴体与上述结合部件相连接，上述第二嘴体包括至少一个注入流路，用于向上述第二喷射口内注入蒸镀材料。