APPARATUS FOR PROCESSING SUBSTRATE

The inventive concept provides a substrate processing apparatus. The substrate processing apparatus includes: a housing defining a processing space; a chuck supporting a substrate at the processing space and providing a bottom electrode for generating plasma at the processing space; a top electrode;...

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Bibliographic Details
Main Authors PARK WANJAE, UM YOUNG JE, KOO JUN-TAEK
Format Patent
LanguageChinese
English
Published 03.02.2023
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:The inventive concept provides a substrate processing apparatus. The substrate processing apparatus includes: a housing defining a processing space; a chuck supporting a substrate at the processing space and providing a bottom electrode for generating plasma at the processing space; a top electrode; and an ion blocker positioned between the top electrode and the processing space. 本发明构思提供一种基板处理设备。所述基板处理设备包括：壳体，其限定处理空间；卡盘，其在所述处理空间处支撑基板并且提供用于在所述处理空间处生成等离子体的底部电极；顶部电极；以及离子阻挡器，其定位在所述顶部电极与所述处理空间之间。
Bibliography:Application Number: CN202210875139