Superconducting thin film preparation method, superconducting thin film, quantum device and quantum chip

• Main Author: YING MAKE
• Format: Patent
• Language: Chinese; English
• Published: 31.01.2023
• Subjects: CALCULATING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS; COMPUTING; COUNTING; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a superconducting thin film preparation method, a superconducting thin film, a quantum device and a quantum chip. The method comprises the steps that a first atmosphere environment where a first superconducting thin film is located is heated from a first temperature to a second temperature, the first superconducting thin film is made to be in the second atmosphere environment, and the first superconducting thin film is a superconducting material deposited on a substrate; after the second atmosphere environment reaches a second temperature, hydrogen atoms are continuously introduced into the second atmosphere environment and maintained for a preset period of time, so that the first superconducting thin film is in a third atmosphere environment, the crystal structure defects of the first superconducting thin film on the micro scale are filled with the hydrogen atoms, and the second temperature is used for maintaining the free state of the hydrogen atoms; and after a preset time length, t