Novel cerium-based particles and polishing slurry composition including same
The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based particle and a polishing slurry composition comprising the same, the cerium-based particle comprising: a self-assembly of microparticles; an...
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| Main Authors | , , |
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| Format | Patent |
| Language | Chinese English |
| Published |
17.01.2023
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| Subjects | |
| Online Access | Get full text |
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| Abstract | The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based particle and a polishing slurry composition comprising the same, the cerium-based particle comprising: a self-assembly of microparticles; and an organic matter.
本发明涉及一种新型铈基粒子及包括其的抛光浆料组合物，更具体地，涉及一种铈基粒子及包括其的抛光浆料组合物，其中所述铈基粒子包括：微粒子的自组装体；以及有机物。 |
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| AbstractList | The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based particle and a polishing slurry composition comprising the same, the cerium-based particle comprising: a self-assembly of microparticles; and an organic matter.
本发明涉及一种新型铈基粒子及包括其的抛光浆料组合物，更具体地，涉及一种铈基粒子及包括其的抛光浆料组合物，其中所述铈基粒子包括：微粒子的自组装体；以及有机物。 |
| Author | LEE JEONG-KYU HWANG JUN HA JANG HYOJUN |
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| DocumentTitleAlternate | 新型铈基粒子及包括其的抛光浆料组合物 |
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| Notes | Application Number: CN202210809900 |
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| Snippet | The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based... |
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| SubjectTerms | ADHESIVES CHEMISTRY DYES METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES |
| Title | Novel cerium-based particles and polishing slurry composition including same |
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