Novel cerium-based particles and polishing slurry composition including same

The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based particle and a polishing slurry composition comprising the same, the cerium-based particle comprising: a self-assembly of microparticles; an...

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Bibliographic Details
Main Authors HWANG JUN HA, LEE JEONG-KYU, JANG HYOJUN
Format Patent
LanguageChinese
English
Published 17.01.2023
Subjects
ADHESIVES
CHEMISTRY
DYES
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
POLISHES
POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH
SKI WAXES
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Summary:The present invention relates to a novel cerium-based particle and a polishing slurry composition comprising the same, and more particularly, to a cerium-based particle and a polishing slurry composition comprising the same, the cerium-based particle comprising: a self-assembly of microparticles; and an organic matter. 本发明涉及一种新型铈基粒子及包括其的抛光浆料组合物，更具体地，涉及一种铈基粒子及包括其的抛光浆料组合物，其中所述铈基粒子包括：微粒子的自组装体；以及有机物。
Bibliography:Application Number: CN202210809900