Large-line-width line scanning photoetching light source module

• Main Authors: ZHOU YAXING, YOU ZHENGJIE, ZHUANG YIZHEN, TANG XIAOSHENG
• Format: Patent
• Language: Chinese; English
• Published: 10.01.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a large-linewidth line scanning photoetching light source module, which comprises an LED light source, a second vertical lens, a TIR lens and a digital micro-reflecting mirror, the left end of the LED light source is provided with a light equalizing mirror group, the second vertical lens is arranged at the left end of the light equalizing mirror group, the TIR lens is arranged at the left end of the second vertical lens, and the digital micro-reflecting mirror is arranged at the left end of the TIR lens. A second vertical lens is arranged, the second vertical lens is arranged at the left end of a light uniformizing mirror set, high-uniformity light spots are generated when light enters the light uniformizing mirror set, the second vertical lens and the light uniformizing mirror set are arranged on the same horizontal plane, the high-uniformity light spots generated by the light uniformizing mirror set are emitted into the second vertical lens, and then the light spots are changed into