Magnetic analyzer and ion implanter

The invention discloses a magnetic analyzer and an ion implanter, the magnetic analyzer comprises an ion beam channel, the ion beam channel comprises a flying area and a first inner wall and a top wall which enclose the flying area, the ion beam channel comprises a first partition plate, and the fir...

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Bibliographic Details
Main Authors YAN LI, JIANG YUFEI, JI XIAOLONG
Format Patent
LanguageChinese
English
Published 29.11.2022
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Summary:The invention discloses a magnetic analyzer and an ion implanter, the magnetic analyzer comprises an ion beam channel, the ion beam channel comprises a flying area and a first inner wall and a top wall which enclose the flying area, the ion beam channel comprises a first partition plate, and the first partition plate is arranged between the first inner wall and the flying area; the first partition plate is provided with a plurality of first through holes, and a containing space is formed between the first partition plate and the first inner wall. The probability that pollution particles are carried out of the magnetic analyzer can be greatly reduced, then the failure of the ion implantation technology is effectively avoided, the manual maintenance period or the spare part replacement period can be greatly prolonged, and therefore the maintenance cost is effectively reduced. 本申请公开了一种磁分析器以及离子注入机,磁分析器包括离子束通道,离子束通道包括飞行区以及合围形成飞行区的第一内壁与顶壁,离子束通道包括第一隔板,第一隔板设置于第一内壁和飞行区之间;其中,第一隔板设置有多个第一通孔,第一隔板和第一内壁之间形成容纳空间。本申请不仅能够大幅降低污
Bibliography:Application Number: CN202210924128