Multi-charged particle beam drawing device and multi-charged particle beam drawing method

• Main Authors: KATO YASUO, KAWANA RYO
• Format: Patent
• Language: Chinese; English
• Published: 25.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A multi-charged particle beam drawing device according to one embodiment of the present invention is characterized by being provided with: a beam forming mechanism that forms a multi-charged particle beam; a dose calculation circuit that calculates a dose at each position on the sample; and an additional dose distribution circuit that irradiates an excessive dose defect beam, which is irradiated with an excessive dose that is not able to control the dose of the beam, from among the multi-charged particle beams, to a dose-deficient position for canceling the excessive dose within the range in which the excessive dose diffuses, thereby distributing the excessive dose to the multi-charged particle beams. Assigning an additional dose to a position within a pattern, the additional dose being used for making a first dose distribution based on the excess dose generated in the sample to be a second dose distribution having a center located within a range of the first dose distribution and located inside a pattern to