Etching liquid composition and preparation method thereof

• Main Authors: OH JUNG SHIK, KIM KI YOUNG, KIM TAE-HO, LEE MYUNG-HO, SONG MYUNG GEUN
• Format: Patent
• Language: Chinese; English
• Published: 25.11.2022
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; POLISHES; SEMICONDUCTOR DEVICES

The present invention relates to a silicon etching liquid composition and a method for preparing the same, and more particularly, to a composition for selectively etching silicon for a silicon insulating film. The etching liquid composition according to the present invention can improve the selective etching ratio of silicon on a semiconductor surface exposed with a silicon oxide film and silicon. 本发明涉及一种硅蚀刻液组合物及其制备方法，尤其，涉及一种对于硅绝缘膜选择性地蚀刻硅的组合物。根据本发明的蚀刻液组合物可以在暴露有氧化硅膜和硅的半导体表面提高硅的选择性蚀刻比。