Vapor deposition mask

• Main Authors: NABETANI HIROMI, NOMOTO YUKA, OKEYA YUTA
• Format: Patent
• Language: Chinese; English
• Published: 15.11.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided is a vapor deposition mask capable of suppressing adhesion of fibers to the vapor deposition mask. This vapor deposition mask is a metal vapor deposition mask (10). The present invention is provided with a grid structure (10M) which has a front surface (10F) and a rear surface, and which has a two-dimensional mesh shape that divides a plurality of mask holes (10H) that connect large openings (HL) located on the front surface (10F) and small openings located on the rear surface. In the surface (10F), the arithmetic mean roughness (Ra) at the boundary between adjacent large openings (HL) is 1.35 [mu] m or less based on JIS B 0601: 2013, and the maximum height (Rz) at the boundary based on JIS B 0601: 2013 is 6.8 [mu] m or less. 提供能够抑制纤维向蒸镀掩模附着的蒸镀掩模。本发明的蒸镀掩模为金属制的蒸镀掩模(10)。具备栅格构造(10M)，该栅格构造(10M)具备表面(10F)以及背面，且具有划分多个掩模孔(10H)的二维的网眼状，该多个掩模孔将位于表面(10F)的大开口(HL)与位于背面的小开口连接。在表面(10F)中，彼此相邻的大开口(HL)的边界处的以JIS B 0601：2013为基准的算术平均粗糙度Ra为1.35μm以下，边界处的以JIS B 0601：2013为基准的最大高度Rz为6.8μm以下。