Method and device for detecting abnormal position of substrate

• Main Authors: WU BIAOPING, NIE PENG, WU QIA
• Format: Patent
• Language: Chinese; English
• Published: 04.11.2022
• Subjects: CALCULATING; COMPUTING; COUNTING; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; PHYSICS; TESTING

The embodiment of the invention provides a substrate position abnormity detection method and device. The detection method comprises the following steps: acquiring standard images when a substrate is respectively positioned on a manipulator and a rotating stand; acquiring a detection image when the substrate is respectively positioned on the manipulator or the rotating stand again; judging whether the deviation between the position of the preset feature in the standard image and the position of the preset feature in the detection image is within a preset range or not; and if the position of the substrate on the manipulator or the rotating stand is not within the preset range, judging that the position of the substrate on the manipulator or the rotating stand again is abnormal. According to the substrate position abnormity detection method provided by the invention, whether the position of the substrate is abnormal or not can be identified in a visual detection mode. 本公开实施例提供了一种基片位置异常的检测方法与检测装置，该检测方法包括：获取基片分别位于