Radiation-sensitive composition, hardened film and manufacturing method thereof, semiconductor and display element

• Main Authors: NAKANISHI TAKUYA, ASAOKA TAKAHIDE, TAKOJIMA KAORU
• Format: Patent
• Language: Chinese; English
• Published: 01.11.2022
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides a radiation-sensitive composition capable of forming a hardened film with excellent developing sealing performance, the hardened film, a manufacturing method of the hardened film, a semiconductor and a display element. The radiation-sensitive composition contains: at least one polymer selected from the group consisting of a polymer containing a structural unit (I) having a group represented by formula (1) or an acid-dissociable group, and a siloxane polymer; a photoacid generator; and a silanol compound which has a partial structure in which a hydrophobic group and a hydroxyl group are bonded to a silicon atom, and which does not have an alkoxy group. In formula (1), R1, R2, and R3 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, an alkoxy group having 1-6 carbon atoms, an alkyl group having 1-10 carbon atoms, or a phenyl group. In this connection, one or more of R1, R2, and R3 is an alkoxy group having 1-6 carbon atoms. '*' represents a bonding bond. 本发明提供一种可形成