Member for semiconductor manufacturing apparatus and semiconductor manufacturing apparatus

• Main Authors: KOGA TATSUYA, NAKAGAWA, RYUNOSUKE
• Format: Patent
• Language: Chinese; English
• Published: 21.10.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

The invention provides a member for a semiconductor manufacturing apparatus and the semiconductor manufacturing apparatus, which can reduce generation or influence of particles. Specifically, the member for a semiconductor manufacturing apparatus according to the present invention is used in a chamber of a semiconductor manufacturing apparatus, and is provided with: a substrate including a first surface, a second surface on the opposite side from the first surface, and at least one hole penetrating the first surface and the second surface; and a ceramic layer provided so as to be exposed at least on the first surface of the base material, the hole having: an inclined surface continuous with the first surface and inclined with respect to a first direction from the first surface toward the second surface; and a vertical surface located between the second surface and the inclined surface in the first direction and extending along the first direction, the angle formed by the first surface and the inclined surface