Radio frequency signal filter device of plasma processing system

An adjustable edge sheath (TES) system includes a coupling ring configured to be coupled to a bottom surface of an edge ring surrounding a wafer support region within a plasma processing chamber. The TES system comprises an annular electrode which is embedded in the coupling ring. The TES system als...

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Bibliographic Details
Main Authors MARAKHTANOV ALEXEI, HOLLAND JOHANN, KOZAKEVICH, FELIX, BHOWMICK, RANADEEP, JI BING
Format Patent
LanguageChinese
English
Published 30.09.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:An adjustable edge sheath (TES) system includes a coupling ring configured to be coupled to a bottom surface of an edge ring surrounding a wafer support region within a plasma processing chamber. The TES system comprises an annular electrode which is embedded in the coupling ring. The TES system also includes a plurality of radio frequency signal supply pins coupled with electrodes within the coupling ring, each of the plurality of radio frequency signal supply pins extending through a corresponding aperture formed through a bottom surface of the coupling ring. The TES system includes a plurality of radio frequency signal filters connected to the plurality of radio frequency supply pins, respectively. Each of the plurality of radio frequency signal filters is configured to provide a high impedance to a radio frequency signal used to generate plasma within the plasma processing chamber. 一种可调边缘鞘(TES)系统包括耦合环，其被配置为耦合到边缘环的底表面，该边缘环围绕等离子体处理室内的晶片支撑区域。该TES系统包括环形电极，其嵌入所述耦合环内。该TES系统还包括多个射频信号供应引脚，其与在耦合环内的电极耦合，所述多个射频信号供应引
Bibliography:Application Number: CN202180012677