Optimization of radio frequency signal ground loop in plasma processing system

• Main Authors: MARAKHTANOV ALEXEI, LUCCHESI KENNETH, HOLLAND JOHANN, KOZAKEVICH, FELIX, BHOWMICK, RANADEEP, JI BING
• Format: Patent
• Language: Chinese; English
• Published: 13.09.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY

And a fixed outer support flange (flange 1) is formed and is externally connected with an electrode in a plasma processing system. The flange 1 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. An articulated outer support flange (flange 2) is formed as an outer flange 1. The flange 2 has a vertical portion and a horizontal portion extending radially outward from a lower end of the vertical portion. The vertical portion of the flange 2 is positioned concentrically outside the vertical portion of the flange 1. The flange 2 is spaced apart from the flange 1 and is movable along a vertical portion of the flange 1. Each of the plurality of conductive strips has a first end connected to the flange 2 and a second end connected to the flange 1. 形成一个固定的外支撑凸缘(凸缘1)以外接等离子体处理系统内的电极。凸缘1具有竖直部分和从竖直部分的下端径向向外延伸的水平部分。铰接式外支撑凸缘(凸缘2)形成为外接凸缘1。凸缘2具有竖直部分和从竖直部分的下端径向向外延伸的水平部分。凸缘2的竖直部分同心地定位在凸缘1的竖直部分的外侧。凸缘2与凸缘1隔开并且可沿凸缘1的竖直部分移动。多个导电带中的每一个都具有连接到凸缘2的第一端部和连接到凸缘1的第二端部。