Growth defect reduction at grating transitions

A semiconductor device is provided. In some embodiments, a semiconductor device includes a first layer having a first region and a second region, the first region being corrugated and having a plurality of corrugations, the second region being non-corrugated. A first cycle of the ripple may have a f...

Full description

Saved in:
Bibliographic Details
Main Author TSAI CURTIS S
Format Patent
LanguageChinese
English
Published 09.09.2022
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:A semiconductor device is provided. In some embodiments, a semiconductor device includes a first layer having a first region and a second region, the first region being corrugated and having a plurality of corrugations, the second region being non-corrugated. A first cycle of the ripple may have a first duty cycle, and a second cycle of the ripple may have a second duty cycle between the first cycle and the second region, and the second duty cycle is between the first duty cycle and a duty cycle of the second region. 一种半导体装置。在一些实施方案中,半导体装置包括:具有第一区域和第二区域的第一层,所述第一区域为波纹状并具有多个波纹,所述第二区域无波纹。波纹的第一循环可以具有第一占空比,并且波纹的第二循环可以具有第二占空比,所述第二循环在第一循环与第二区域之间,并且第二占空比在第一占空比与第二区域的占空比之间。
Bibliography:Application Number: CN202080096042