Method for regenerating target material and method for forming material thin film

• Main Authors: WANG BAIWEI, LIN MINGXIAN, QIU YAQIN, LIN TINGFU
• Format: Patent
• Language: Chinese; English
• Published: 06.09.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING; CLEANING IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

The invention discloses a method for regenerating a target material and a method for forming a material film. The method for regenerating the target material comprises the step of providing the target material. The target material is provided with a surface, and the surface is provided with a redeposition film. The entirety of the surface of the target is irradiated with a first laser beam. A portion of the surface of the target is irradiated with a second laser beam to clear the redeposited film. 一种再生靶材的方法及形成材料薄膜的方法，再生靶材的方法包括提供靶材。靶材具有一表面，且此表面具有再沉积薄膜。使用第一激光光束照射靶材的表面的整体。使用第二激光光束照射靶材的表面的一部分，以清除再沉积薄膜。