Quantum well bias and stress sensor
The invention relates to a quantum well bias and stress sensor, and according to one aspect of the invention, a bias and stress sensor is provided, comprising: a substrate; a first electrode disposed on the substrate; a semiconductor buffer layer disposed on the first electrode; the first semiconduc...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
30.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a quantum well bias and stress sensor, and according to one aspect of the invention, a bias and stress sensor is provided, comprising: a substrate; a first electrode disposed on the substrate; a semiconductor buffer layer disposed on the first electrode; the first semiconductor doping layer is arranged on the semiconductor buffer layer; the first semiconductor isolation layer is arranged on the first semiconductor doping layer; the second semiconductor isolation layer is arranged on the first semiconductor isolation layer; the second semiconductor doping layer is arranged on the second semiconductor isolation layer; the second electrode is arranged on the second semiconductor doping layer; the piezoelectric semiconductor layer is arranged between the first semiconductor isolation layer and the second semiconductor isolation layer and can sense bias voltage and stress, and the quantum well is a semiconductor quantum well.
本发明提涉及量子阱偏压和应力传感器,并且根据本发明的一个方面,提供了偏压和应力传感器,其包括:基底;设置在所述基底上的第一电极; |
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Bibliography: | Application Number: CN202210559764 |