Internally separable processing chamber using baffle plate assembly

• Main Authors: SUBRAMANI ANANTHA K, GUO YANG, MAZZOCCO JOHN JOSEPH
• Format: Patent
• Language: Chinese; English
• Published: 26.08.2022
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

Provided herein are apparatuses and methods for forming and using an internally separable physical vapor deposition (PVD) processing chamber using a baffle disc. In some embodiments, an internally separable processing chamber may include: an upper chamber portion having a tapered shield, a tapered adapter, a cover ring, and a target; a lower chamber portion having a substrate support, the substrate support having inner and outer deposition rings, and wherein the substrate support is vertically movable; and a baffle plate assembly configured to internally separate the processing chamber and establish a separate sealed deposition cavity and a separate sealed oxidation cavity, wherein the baffle plate assembly includes one or more seals disposed along an outer edge of the baffle plate assembly and is configured to contact at least one of the conical shield, the conical adapter, or the deposition ring to form separate sealed deposition and oxidation cavities. 本文提供了用于使用挡盘来形成和使用内部可分的物理气相沉积(PVD)处理腔室的设备和方法。在一些实施方式中，内