Method for manufacturing infrared cutoff filter, filter for solid-state imaging element, and solid-state imaging element

• Main Authors: HIRAI YURI, AKENO YASUTAKE, IWATA REIKO
• Format: Patent
• Language: Chinese; English
• Published: 12.08.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES

The manufacturing method of the infrared light cut-off filter comprises the following steps: forming an infrared light cut-off layer containing an infrared light absorbing pigment; forming a protective layer for the stripping liquid on the infrared light cut-off layer; forming a resist pattern on the protective layer; patterning the protective layer and the infrared light cut-off layer using a resist pattern by dry etching; and stripping the resist pattern from the protective layer using a stripping liquid. 一种红外光截止滤光片的制造方法，包括：形成含有红外光吸收色素的红外光截止层；在红外光截止层上形成针对剥离液的保护层；在保护层上形成抗蚀剂图案；利用干式蚀刻，使用抗蚀剂图案使保护层和红外光截止层图案化；以及使用剥离液将抗蚀剂图案从保护层上剥离。