Method for preparing porous graphene membrane and membrane prepared using same
A method for preparing a porous graphene layer (5) having a thickness of less than 100 nm, the method comprising the steps of: providing a catalytically active substrate (1) provided on a surface (3) thereof with a plurality of catalytically active-free domains (2) having dimensions substantially co...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
05.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | A method for preparing a porous graphene layer (5) having a thickness of less than 100 nm, the method comprising the steps of: providing a catalytically active substrate (1) provided on a surface (3) thereof with a plurality of catalytically active-free domains (2) having dimensions substantially corresponding to the dimensions of pores (6) in the resulting porous graphene layer (5); performing chemical vapor deposition and forming a porous graphene layer (5) on the surface (3) of the catalytic activity substrate (1); wherein the catalytically active substrate (1) is a copper-nickel alloy substrate having a copper content in the range of 98 wt% to less than 99.96 wt% and a nickel content in the range of greater than 0.04 wt% to 2 wt%, the copper content and the nickel content being complementary to 100 wt% of the catalytically active substrate (1).
一种用于制备厚度小于100nm的多孔石墨烯层(5)的方法,所述方法包括以下步骤:提供催化活性基底(1),所述催化活性基底(1)在其表面(3)上设置有多个无催化活性域(2),所述多个无催化活性域(2)的尺寸基本上对应于所得多孔石墨烯层(5)中的孔(6)的尺寸;进行化学气相沉积并在催化活性基底(1)的表面(3)上形成多孔石墨烯层 |
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Bibliography: | Application Number: CN202080088031 |