Concentration compensation method of gas flow control device
The invention provides a concentration compensation method for a gas flow control device, and the method comprises the steps: obtaining a theoretical pressure difference of a differential pressure sensor and an initial opening value of a flow adjustment unit according to a target flow, controlling t...
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Main Authors | , , , , , , , , , , , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
05.08.2022
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Subjects | |
Online Access | Get full text |
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Summary: | The invention provides a concentration compensation method for a gas flow control device, and the method comprises the steps: obtaining a theoretical pressure difference of a differential pressure sensor and an initial opening value of a flow adjustment unit according to a target flow, controlling the flow adjustment unit based on the initial opening value, and obtaining an actual pressure difference of the differential pressure sensor; whether the absolute value of the difference between the actual pressure difference and the theoretical pressure difference is larger than 0 and smaller than or equal to a threshold value or not is judged, and if not, the initial opening value is corrected through the actual opening value to adjust the flow adjusting unit; and if the actual pressure difference is larger than the theoretical pressure difference, comparing the actual pressure difference with the theoretical pressure difference, if the actual pressure difference is larger than the theoretical pressure difference, |
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Bibliography: | Application Number: CN202210395457 |