Concentration compensation method of gas flow control device

• Main Authors: FENG QINGHAO, YIN GUANGSHENG, YANG CHONGXIN, WU XIAOYANG, LIU WENLIANG, GUO HUANLI, XU JUN, MEI XIAOQIANG, DOU HAO, DING WANSHENG, LI JINYING, YAN TAO, LI DEAN, TAN XIAOXIAO, TAO XI, YAN XIANSUO, BI YANGENG, AN RUIJUN, TIAN HONGBING, LIU PENGGANG
• Format: Patent
• Language: Chinese; English
• Published: 05.08.2022
• Subjects: CONTROLLING; PHYSICS; REGULATING; SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES

The invention provides a concentration compensation method for a gas flow control device, and the method comprises the steps: obtaining a theoretical pressure difference of a differential pressure sensor and an initial opening value of a flow adjustment unit according to a target flow, controlling the flow adjustment unit based on the initial opening value, and obtaining an actual pressure difference of the differential pressure sensor; whether the absolute value of the difference between the actual pressure difference and the theoretical pressure difference is larger than 0 and smaller than or equal to a threshold value or not is judged, and if not, the initial opening value is corrected through the actual opening value to adjust the flow adjusting unit; and if the actual pressure difference is larger than the theoretical pressure difference, comparing the actual pressure difference with the theoretical pressure difference, if the actual pressure difference is larger than the theoretical pressure difference,