Ultra-high-speed multi-channel plasma sensing device

• Main Authors: KIM YONG-SIK, KANG KWANG-KI, JUNG HONG-JONG, CHOI BEOM-HO, LEE SEUNG-SOO, KIM YONG GYU, LEE SUK-HO
• Format: Patent
• Language: Chinese; English
• Published: 15.07.2022
• Subjects: MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; PHYSICS; TESTING

The present invention relates to an ultra-high-speed multi-channel plasma sensing device, comprising: a first antenna module which is connected to a first output terminal, receives a first leakage current leaked through a substrate, and is capable of improving the receiving sensitivity of the leakage current, the first output end is in contact with the substrate on a chuck of a process chamber and extends to the ground; a first current sensing module, wherein the first current sensing module is used for sensing the first leakage current; a current measurement module that receives the first leakage current output from the first current sensing module and generates first leakage current measurement information calculated according to a set cycle; and a control module that compares the first leakage current measurement information with a reference value to generate first arc generation information. 本发明涉及一种超高速多通道等离子体感测装置，包括：第一天线模块，所述第一天线模块与第一输出端连接，且接收通过所述基板泄漏的第一泄漏电流而能够提高泄漏电流的接收灵敏度，其中，所述第一输出端在工艺腔室的卡盘上与所述基板接触并向地面延伸