Leakage current measuring structure and measuring method

• Main Authors: NING DIANHUA, LIU YONGSHENG, HUANG XIAOLEI, OTHER INVENTORS HAVE WAIVED THE RIGHT TO BE MENTIONED, LI HEQIN
• Format: Patent
• Language: Chinese; English
• Published: 12.07.2022
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention discloses a leakage current measuring structure and a measuring method, the measuring structure comprises an epitaxial structure, a plurality of passivation layers located on the epitaxial structure, a metal contact layer located on the epitaxial structure and a plurality of metal layers located on the epitaxial structure and/or the passivation layers, and two-dimensional electron gas is formed in the epitaxial structure. The metal contact layer is electrically connected with the two-dimensional electron gas, the metal layer comprises a metal block and a metal ring which are located in an area above the two-dimensional electron gas, the metal block is located in the metal ring, and the metal block and the metal ring are separately arranged; the measuring structure is used for measuring a first leakage current along the direction of the interface below the metal layer and/or a second leakage current perpendicular to the direction of the interface below the metal layer. According to the measuremen