Base and vesicle complex with high salt resistance and preparation method of base and vesicle complex

• Main Authors: YAO ZHIYIN, HOU WANGUO, DU NA, CHEN NAN
• Format: Patent
• Language: Chinese; English
• Published: 05.07.2022
• Subjects: CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; THEIR RELEVANT APPARATUS; TRANSPORTING

The invention relates to a base and vesicle complex with high salt resistance and a preparation method of the base and vesicle complex. The complex comprises a basic group and a vesicle, the basic group is embedded in a double-layer membrane and an inner water cavity of the vesicle, and the solubility and dispersity of the basic group are improved. In the base and vesicle complex, the core-shell double-layer membrane structure of the vesicle not only solubilizes the base, but also has synergistic interaction with the base to resist attack of metal ions to a head-based hydration layer of a vesicle precursor, so that the base and vesicle complex stably exists in a high-salinity environment. The salt resistance is hundreds or even thousands of times that of a traditional surfactant vesicle system, and the application range of the existing vesicle system is widened. The base and vesicle complex is simple in preparation method, mild in process and suitable for large-scale production, and has good application prosp