Multiphase growth sequence for forming vertical cavity surface emitting lasers

A method of forming a vertical cavity surface emitting laser (VCSEL) device using a multiphase growth sequence includes forming a first mirror on a substrate; forming an active region (e.g., a dilute nitride active region) on the first mirror; forming an oxidation hole (OA) layer on the active regio...

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Bibliographic Details
Main Authors ZHAO GUOWEI, BARVE AJIT VIJAY, PETERS MATTHEW GLENN, YANG JUN
Format Patent
LanguageChinese
English
Published 01.07.2022
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Summary:A method of forming a vertical cavity surface emitting laser (VCSEL) device using a multiphase growth sequence includes forming a first mirror on a substrate; forming an active region (e.g., a dilute nitride active region) on the first mirror; forming an oxidation hole (OA) layer on the active region; forming a spacer on the surface of the OA layer; and forming a second mirror on the spacer. In a molecular beam epitaxy stage of the multiphase growth sequence, the active region is formed using a molecular beam epitaxy (MBE) process, and in a metal organic chemical vapor deposition (MOCVD) stage of the multiphase growth sequence, the second mirror is formed using a metal organic chemical vapor deposition process. 一种使用多相生长序列形成垂直腔面发射激光器(VCSEL)装置的方法,包括:在基板上形成第一反射镜;在第一反射镜上形成有源区(例如,稀氮化物有源区);在有源区上形成氧化孔(OA)层;在所述OA层的表面上形成间隔物;以及在间隔物上形成第二反射镜。在多相生长序列的分子束外延阶段,使用分子束外延(MBE)工艺形成有源区,在多相生长序列的金属有机化学气相沉积(MOCVD)阶段,使用金属有机化学气相沉积工艺形成第二反射镜。
Bibliography:Application Number: CN202111504358