Manufacturing method of electron emitter, electron source and image formation equipment

一种电子发射器件的制造方法,所述电子发射器件包括一个导电薄膜,所述导电薄膜包括一个设置在一个基片上的一对电极之间的电子发射区,所述方法包括一个通过一个喷嘴将一种包含所述导电薄膜的组分元素的溶液喷涂到所述基片上,在所述电极对之间产生电位差的步骤。本发明还涉及一种电子源的制造方法和一种成像设备的制造方法。 A method of manufacturing an electron emitting device (104) of the type having, on a substrate 1, an electroconductive thin film (3) with an electro...

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Bibliographic Details
Main Authors TSUKAMOTO TAKEO, YAMANOBE MASATO, YAMAMOTO KEISUKE
Format Patent
LanguageChinese
English
Published 21.04.2004
Edition7
Subjects
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Summary:一种电子发射器件的制造方法,所述电子发射器件包括一个导电薄膜,所述导电薄膜包括一个设置在一个基片上的一对电极之间的电子发射区,所述方法包括一个通过一个喷嘴将一种包含所述导电薄膜的组分元素的溶液喷涂到所述基片上,在所述电极对之间产生电位差的步骤。本发明还涉及一种电子源的制造方法和一种成像设备的制造方法。 A method of manufacturing an electron emitting device (104) of the type having, on a substrate 1, an electroconductive thin film (3) with an electron-emitting region (2), connected to respective electrodes (4,5). The electroconductive film (3) is formed by spraying through a nozzle (33;131) a solution containing component elements of the electroconductive thin film (3) which is to be formed. Spraying is performed whilst an electrical potential difference (V) is produced between the electrodes (4,5), between the nozzle (131) and the substrate (1), or both. The effect is to improve adherence of the film (3) to the substrate (1) or substrate and electrodes (1,4,5). This method may be extended to the manufacture of an electron source (1,102-104) having an array of electron-emitting devices (104).
Bibliography:Application Number: CN20001020244