Preparation method of Co9S8 single crystal transition metal sulfide film

The invention belongs to the field of pulse laser deposition technology and transition metal sulfide film preparation, and particularly provides a preparation method of a Co9S8 single crystal transition metal sulfide film, which is used for obtaining a high-quality epitaxial sulfide film. The Co9S8...

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Bibliographic Details
Main Authors GAO YUNCHONG, TAO SIXU, ZHOU XIANGYIN, QIAO LIANG
Format Patent
LanguageChinese
English
Published 21.06.2022
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Summary:The invention belongs to the field of pulse laser deposition technology and transition metal sulfide film preparation, and particularly provides a preparation method of a Co9S8 single crystal transition metal sulfide film, which is used for obtaining a high-quality epitaxial sulfide film. The Co9S8 single-crystal epitaxial film is prepared for the first time through CoS target material preparation and deposition parameter accurate design by utilizing a pulse laser deposition method, and compared with Co9S8 powder or blocks, the Co9S8 single-crystal epitaxial film can have better physical properties, and compared with an existing transition metal sulfide film, the Co9S8 single-crystal epitaxial film has the advantages that the performance of the Co9S8 single-crystal epitaxial film is improved, and the performance of the Co9S8 single-crystal epitaxial film is improved. The Co9S8 single crystal epitaxial thin film has the advantages of high crystal quality, relatively thin thickness and good electric transport p
Bibliography:Application Number: CN202210300347