CMOS color image sensor with metamaterial color separation
Methods of constructing multifunctional scattering structures while complying with the strict requirements imparted by the manufacturing process are described. The described methods and apparatus are based on etching off a network of wires embedded in a 3D structure to form voids, thereby performing...
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Main Authors | , , , |
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Format | Patent |
Language | Chinese English |
Published |
27.05.2022
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Abstract | Methods of constructing multifunctional scattering structures while complying with the strict requirements imparted by the manufacturing process are described. The described methods and apparatus are based on etching off a network of wires embedded in a 3D structure to form voids, thereby performing an objective function. The invention further discloses an optimization algorithm for designing the binary device meeting the manufacturing requirements.
描述了在遵守制造工艺赋予的严格需求的同时构建多功能散射结构的方法。所描述的方法和装置基于蚀刻掉嵌入3D结构中的丝线网络以形成空隙,从而执行目标函数。还公开了用于设计满足制造需求的二元化器件的优化算法。 |
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AbstractList | Methods of constructing multifunctional scattering structures while complying with the strict requirements imparted by the manufacturing process are described. The described methods and apparatus are based on etching off a network of wires embedded in a 3D structure to form voids, thereby performing an objective function. The invention further discloses an optimization algorithm for designing the binary device meeting the manufacturing requirements.
描述了在遵守制造工艺赋予的严格需求的同时构建多功能散射结构的方法。所描述的方法和装置基于蚀刻掉嵌入3D结构中的丝线网络以形成空隙,从而执行目标函数。还公开了用于设计满足制造需求的二元化器件的优化算法。 |
Author | ROBERTS GARETH KAMAIDE-MUNOZ PEDRO FARAON AMIR BALLOU CEDRIC |
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DocumentTitleAlternate | 具有超材料分色的CMOS彩色图像传感器 |
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Title | CMOS color image sensor with metamaterial color separation |
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