CMOS color image sensor with metamaterial color separation

Methods of constructing multifunctional scattering structures while complying with the strict requirements imparted by the manufacturing process are described. The described methods and apparatus are based on etching off a network of wires embedded in a 3D structure to form voids, thereby performing...

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Bibliographic Details
Main Authors BALLOU CEDRIC, KAMAIDE-MUNOZ PEDRO, ROBERTS GARETH, FARAON AMIR
Format Patent
LanguageChinese
English
Published 27.05.2022
Subjects
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:Methods of constructing multifunctional scattering structures while complying with the strict requirements imparted by the manufacturing process are described. The described methods and apparatus are based on etching off a network of wires embedded in a 3D structure to form voids, thereby performing an objective function. The invention further discloses an optimization algorithm for designing the binary device meeting the manufacturing requirements. 描述了在遵守制造工艺赋予的严格需求的同时构建多功能散射结构的方法。所描述的方法和装置基于蚀刻掉嵌入3D结构中的丝线网络以形成空隙，从而执行目标函数。还公开了用于设计满足制造需求的二元化器件的优化算法。
Bibliography:Application Number: CN201980101356